plasma chemical vapour deposition

Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper.

本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况.

Sulfur incorporation in diamond was performed by B-S co-doping method via microwave plasma chemical vapour deposition ( MPCVD) technique on undoped Si as substrates. Dimethyl disulfide and boron oxide were the doping sources, which were diluted in acetone.

利用微波等离子体化学气相沉积（MPCVD）技术，以丙酮为碳源，用二甲基二硫和三氧化二硼作掺杂源，在硅衬底上制备了硼与硫共掺杂的金刚石薄膜。

The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition ( MW& PCVD) research device.

利用石英钟罩式微波等离子体化学气相沉积（MW－PCVD）实验装置研究了不同沉积气压对金刚石薄膜沉积结果的影响。